Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Soichiro Handa, Hidekazu Mimura, Satoshi Matsuyama, Hirokatsu Yumoto, Takashi Kimura, Yasuhisa Sano, Kenji Tamasaku, Yoshinori Nishino, Makina Yabashi, Tetsuya Ishikawa, Kazuto Yamauchi

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抜粋

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

元の言語英語
ホスト出版物のタイトルAdvances in Metrology for X-Ray and EUV Optics II
DOI
出版物ステータス出版済み - 12 1 2007
外部発表Yes
イベントAdvances in Metrology for X-Ray and EUV Optics II - San Diego, CA, 米国
継続期間: 8 30 20078 30 2007

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
6704
ISSN(印刷物)0277-786X

その他

その他Advances in Metrology for X-Ray and EUV Optics II
米国
San Diego, CA
期間8/30/078/30/07

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • これを引用

    Handa, S., Mimura, H., Matsuyama, S., Yumoto, H., Kimura, T., Sano, Y., Tamasaku, K., Nishino, Y., Yabashi, M., Ishikawa, T., & Yamauchi, K. (2007). Hard x-ray wavefront measurement and control for hard x-ray nanofocusing. : Advances in Metrology for X-Ray and EUV Optics II [670404] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 6704). https://doi.org/10.1117/12.733749