High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma

Chisato Niikura, Naho Itagaki, Michio Kondo, Yoshinobu Kawai, Akihisa Matsuda

研究成果: Contribution to journalConference article

42 被引用数 (Scopus)

抄録

We developed a novel technique for high-rate growth of microcrystalline silicon films by plasma-enhanced chemical vapor deposition, designing a novel cathode with interconnected multi-holes, which leads to generate uniformly flat-distributed stable high-density-plasma spots near cathode-surface. Improvement of quality of high-rate grown films was discussed, and microcrystalline silicon films with a low defect density of 1.2×10 16 cm-3 were obtained at a high rate of 7.7 nm/s, demonstrating the efficient gas dissociation and the effectiveness of the novel cathode. The spatial distribution of plasma at cathode-surface holes was analyzed using optical emission spectroscopy for further optimization of plasma conditions.

本文言語英語
ページ(範囲)84-89
ページ数6
ジャーナルThin Solid Films
457
1
DOI
出版ステータス出版済み - 6 1 2004
イベント16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, 日本
継続期間: 6 4 20036 5 2003

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

フィンガープリント 「High-rate growth of microcrystalline silicon films using a high-density SiH<sub>4</sub>/H<sub>2</sub> glow-discharge plasma」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル