Tungsten deposits were produced by sputtering method using hydrogen isotope RF plasma, and the density and the incorporated components in the deposits were investigated. The density changed in the range from 14.2 g/cm3 to 6.1 g/cm3, and hydrogen isotope retention changed in the range from 0.25 to 0.05 as (H + D)/W by the difference of deposition conditions. Both the density and hydrogen isotope retention tended to decrease with an increase of pressure. Even though a deuterium gas was used for producing tungsten deposits, not only deuterium but also hydrogen, oxygen and water vapor were incorporated in the deposits. It is considered that the incorporation of these components originated in water vapor unintentionally existing in the vacuum chamber.
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