Hydrogen incorporation in tungsten deposits growing by deuterium plasma sputtering

Kazunari Katayama, Sanshiro Kasahara, Shinichiro Ishikawa, Satoshi Fukada, Masabumi Nishikawa

研究成果: Contribution to journalArticle査読

7 被引用数 (Scopus)

抄録

Tungsten deposits were produced by sputtering method using hydrogen isotope RF plasma, and the density and the incorporated components in the deposits were investigated. The density changed in the range from 14.2 g/cm3 to 6.1 g/cm3, and hydrogen isotope retention changed in the range from 0.25 to 0.05 as (H + D)/W by the difference of deposition conditions. Both the density and hydrogen isotope retention tended to decrease with an increase of pressure. Even though a deuterium gas was used for producing tungsten deposits, not only deuterium but also hydrogen, oxygen and water vapor were incorporated in the deposits. It is considered that the incorporation of these components originated in water vapor unintentionally existing in the vacuum chamber.

本文言語英語
ページ(範囲)1702-1705
ページ数4
ジャーナルFusion Engineering and Design
86
9-11
DOI
出版ステータス出版済み - 10 2011

All Science Journal Classification (ASJC) codes

  • 土木構造工学
  • 原子力エネルギーおよび原子力工学
  • 材料科学(全般)
  • 機械工学

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