Improvement in contact resistance of 4H-SiC by excimer laser doping using silicon nitride films

R. Kojima, Hiroshi Ikenoue, M. Suwa, Akihiro Ikeda, Daisuke Nakamura, Tanemasa Asano, T. Okada

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

1 被引用数 (Scopus)

抄録

We have proposed a novel method of low-temperature nitrogen doping into 4H-SiC(0001) induced by KrF excimer laser irradiation to a SiN x film. The SiN x film with a thickness of 100 nm was deposited on an n-type 4H-SiC(0001) substrate by chemical vapor deposition. Laser beam size on the sample surface was 300 μm×300 μm. Irradiation fluence was 1.0 J/cm 2 -4.0 J/cm 2 , and the number of shots was from 1 shot to 30 shots. Laser irradiation was performed in a vacuum chamber to avoid oxidation of the SiC surface. High concentration nitrogen doping (∼1×10 21 /cm 3 at the surface) and very low contact resistance with ohmic I-V characteristics can be achieved by laser ablation of the SiN x film. In the case of laser irradiation at the fluence of 2.0 J/cm 2 , the SiN x film was almost ablated without laser ablation of the SiC substrate. Then, excellent ohmic contact characteristics was obtained at the irradiation number of 5 shots, and it was hardly deteriorated up to 30 shots. In the case of irradiation fluence above 3.0 J/cm 2 , ablation of the SiC substrates was induced and ohmic contact characteristics were deteriorated with increasing the number of shots. From these results, we conclude that excellent ohmic contact characteristics without irradiation damage to SiC substrates can be obtained in a stable.

本文言語英語
ホスト出版物のタイトルLaser 3D Manufacturing III
編集者Alberto Pique, Bo Gu, Henry Helvajian
出版社SPIE
ISBN(電子版)9781628419733
DOI
出版ステータス出版済み - 1月 1 2016
イベントLaser 3D Manufacturing III - San Francisco, 米国
継続期間: 2月 15 20162月 18 2016

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
9738
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

その他

その他Laser 3D Manufacturing III
国/地域米国
CitySan Francisco
Period2/15/162/18/16

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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