Improvement of Si adhesion and reduction of electron recombination for Si quantum dot-sensitized solar cells

Hyunwoong Seo, Yuting Wang, Muneharu Sato, Giichiro Uchida, Kunihiro Kamataki, Naho Itagaki, Kazunori Koga, Masaharu Shiratani

研究成果: ジャーナルへの寄稿学術誌査読

8 被引用数 (Scopus)

抄録

Quantum dots (QDs) based on multiple exciton generation have attracted much attention. They are capable of generating multiple electrons by single-photon absorption. Si is one of the good QD sources and its nontoxicity and abundance are advantageous for photovoltaics. In this work, Si QDs were fabricated by multihollow discharge plasma chemical vapor deposition, and they were applied to Si QD-sensitized solar cells. Their initial performance was poor because of the weak adhesion of Si and charge recombination. In this work, we solved these problems through the functionalization of Si QDs and a ZnO barrier. Functionalized Si QDs were more adsorbed on TiO2 with strengthened adhesion and the ZnO barrier prevented the contact between TiO2 and the redox electrolyte. Consequently, the improved adhesion and the reduced electron recombination led to the enhancement of overall photovoltaic characteristics.

本文言語英語
論文番号01AD05
ジャーナルJapanese journal of applied physics
52
1 PART2
DOI
出版ステータス出版済み - 1月 1 2013

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

フィンガープリント

「Improvement of Si adhesion and reduction of electron recombination for Si quantum dot-sensitized solar cells」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル