TY - GEN
T1 - In-situ measurements of cluster volume fraction in silicon thin films using quartz crystal microbalances
AU - Kim, Yeonwon
AU - Hatozaki, Kosuke
AU - Hashimoto, Yuji
AU - Seo, Hyunwoong
AU - Uchida, Giichiro
AU - Kamataki, Kunihiro
AU - Itagaki, Naho
AU - Koga, Kazunori
AU - Shiratani, Masaharu
PY - 2012/11/28
Y1 - 2012/11/28
N2 - We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM's) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM's. The resulls show that the higher deposition rate leads to the higher volume fraction of clusters.
AB - We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM's) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM's. The resulls show that the higher deposition rate leads to the higher volume fraction of clusters.
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U2 - 10.1557/opl.2012.839
DO - 10.1557/opl.2012.839
M3 - Conference contribution
AN - SCOPUS:84869814603
SN - 9781605114033
T3 - Materials Research Society Symposium Proceedings
SP - 307
EP - 311
BT - Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2012
T2 - 2012 MRS Spring Meeting
Y2 - 9 April 2012 through 13 April 2012
ER -