In situ observation of particle behavior in rf silane plasmas

Masaharu Shiratani, Syohichiroh Matsuo, Yukio Watanabe

研究成果: Contribution to journalArticle査読

31 被引用数 (Scopus)

抄録

In situ observation of growth and behavior of particles formed in rf discharges of silane gas is carried out by using a Mie scattering method together with an rf modulation method, in which the applied voltage is modulated by a low-frequency square wave. The observation reveals that particles have a growth time quite longer than their extinction time and also are charged up negatively to be trapped in the discharging space. The drastic suppression of the particle growth realized in square-wave-amplitude-modulated rf discharges can be explained by taking into account the above features and further fallolf of time-averaged densities of short lifetime species by the rf modulation.

本文言語英語
ページ(範囲)1887-1892
ページ数6
ジャーナルJapanese Journal of Applied Physics
30
8
DOI
出版ステータス出版済み - 8 1991

All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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