In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

T. Yatsui, K. Hirata, Y. Tabata, W. Nomura, T. Kawazoe, M. Naruse, M. Ohtsu

    研究成果: ジャーナルへの寄稿学術誌査読

    14 被引用数 (Scopus)

    抄録

    We performed in situ real-time monitoring of the change in surface roughness during self-organized optical near-field etching. During near-field etching of a silica substrate, we detected the scattered light intensity from a continuum wave (CW) laser (λ = 633 nm) in addition to the etching CW laser (λ = 532 nm) light source. We discovered that near-field etching not only decreases surface roughness, but also increases the number of scatterers, as was confirmed by analyzing the AFM image. These approaches provide optimization criteria for the etching parameter and hence for further decreases in surface roughness.

    本文言語英語
    論文番号355303
    ジャーナルNanotechnology
    21
    35
    DOI
    出版ステータス出版済み - 3月 9 2010

    !!!All Science Journal Classification (ASJC) codes

    • バイオエンジニアリング
    • 化学 (全般)
    • 材料科学(全般)
    • 材料力学
    • 機械工学
    • 電子工学および電気工学

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