Influence of electric field upon current collapse phenomena and reliability in high voltage GaN-HEMTs

Wataru Saito, Tomohiro Nitta, Yorito Kakiuchi, Yasunobu Saito, Takao Noda, Hidetoshi Fujimoto, Akira Yoshioka, Tetsuya Ohno

研究成果: 書籍/レポート タイプへの寄稿会議への寄与

21 被引用数 (Scopus)

抄録

This paper reports that the maximum electric field is a dominant factor for current collapse phenomena and reliability in high-voltage GaN-HEMTs. The relation between the dynamic on-resistance increase caused by the collapse phenomena and the maximum electric field peak showed universality, which was independent from the field plate (FP) structure and the wafer. The gate-edge electric field strongly affects the increase of the dynamic on-resistance. After the continuous switching test for 7 hours, the change of the dynamic on-resistance also depended on the maximum electric field. The optimal FP structure minimized the increase of the dynamic on-resistance and realized high reliability due to minimization of the electric field peaks.

本文言語英語
ホスト出版物のタイトル2010 22nd International Symposium on Power Semiconductor Devices and IC's, ISPSD 2010
ページ339-342
ページ数4
出版ステータス出版済み - 9月 20 2010
外部発表はい
イベント2010 22nd International Symposium on Power Semiconductor Devices and IC's, ISPSD 2010 - Hiroshima, 日本
継続期間: 6月 6 20106月 10 2010

出版物シリーズ

名前Proceedings of the International Symposium on Power Semiconductor Devices and ICs
ISSN(印刷版)1063-6854

会議

会議2010 22nd International Symposium on Power Semiconductor Devices and IC's, ISPSD 2010
国/地域日本
CityHiroshima
Period6/6/106/10/10

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)

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