Influence of ion beam scattering on the electrical resistivity of platinum hot films

Masahiro Narasaki, Haidong Wang, Yasuyuki Takata, Koji Takahashi

研究成果: ジャーナルへの寄稿学術誌査読

1 被引用数 (Scopus)

抄録

Platinum hot films have been used as precise resistance thermometers to measure the thermal conductivities of carbon nanotubes and graphene. Assisted by focused ion beam (FIB) irradiation, the influence of defects on phonon transport have been examined. However, wide lateral ion beam scattering may affect the electrical properties of hot films and cause uncertainty. In this letter, the effect of FIB irradiation on the electrical resistivity of platinum hot films was evaluated. To investigate this effect qualitatively, electrical resistivity measurement and FIB irradiation were alternated while changing irradiation positions and doses. Irradiated ions were found to travel further than 25 μm away from the directly irradiated area, resulting in an increase of electrical resistivity of the film according to total accumulated dose. The number of scattered ions was found to depend on the irradiated surface. An empirical equation describing the relationship between electrical resistivity and assumed ion density in the hot films was proposed. The obtained results enable us to accurately estimate the thermal or electrical properties of nanomaterials using hot-film sensors combined with nanofabrication techniques using FIB.

本文言語英語
ページ(範囲)15-18
ページ数4
ジャーナルMicroelectronic Engineering
166
DOI
出版ステータス出版済み - 12月 1 2016

!!!All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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