Influence of the addition of silsesquioxane on the dewetting behavior of polystyrene thin film

Nao Hosaka, Keiji Tanaka, Hideyuki Otsuka, Atsushi Takahara

研究成果: Contribution to journalArticle査読

19 被引用数 (Scopus)

抄録

A strategy to suppress the dewetting of polystyrene (PS) thin films by the addition of octacyclopentylsilsesquioxane (cPOSS) as a nanofiller was proposed. PS thin films with cPOSS were prepared by spin-coating. The bulk glass transition temperature of PS was not changed with an addition of the nanofiller up to 10 wt%. On the other hand, the addition of cPOSS to the PS thin films led to a great inhibition of dewetting. After annealing for 3 h at 373 K, no appreciable dewetting was observed by optical microscopy in the PS film with 15 wt% cPOSS, in contrast, the PS film without cPOSS was completely dewetted. Holes formed on the PS films with 10 wt% cPOSS. However, in that case, the growth of the holes stopped before reaching the final stage of the dewetting. This suggests that the increase of the cPOSS concentration per unit area at the rim of the holes prevents further growth of the holes, and this inhibition effect can be attributed to the interaction between cPOSS and the substrate accompanying modification of the PS-substrate interface.

本文言語英語
ページ(範囲)297-306
ページ数10
ジャーナルComposite Interfaces
11
4
DOI
出版ステータス出版済み - 2004

All Science Journal Classification (ASJC) codes

  • セラミックおよび複合材料
  • 物理学および天文学(全般)
  • 表面、皮膜および薄膜

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