Inhibition of silicic acid elution during the regeneration of strong base anion exchange resin column

Takaaki Chuuman, Kinnosuke Eguchi, Marina Akinaga, Daisuke Kawamoto, Shigeki Horii, Kotaro Yonezu, Koichiro Watanabe, Takushi Yokoyama

研究成果: ジャーナルへの寄稿記事

抄録

To determine why silicic acid elution is often incomplete during regeneration of strong base anion exchange resin columns, an OH- type anion exchange resin (OH- type resin) adsorbing silicic acid was prepared and the desorption (elution) behavior of silicic acid adsorbed to the resin was examined by batch and column experiments. It was first found that silicic acid adsorbed to an OH- type resin polymerizes to form polysilicic acids (Q1, Q2 and Q3 structures) even when a smaller amount of silicic acid than the ion exchange capacity was adsorbed (unsaturated adsorption). Consequently, elution of silicic acid from the OH- type resin column is most likely caused by hydrolytic decomposition of polysilicic acid. Silicic acids with Q0, Q1 and Q2 structures can be easily desorbed from the OH- type resin by immersing them in a 1% NaOH solution for 5min. On the other hand, silicic acid with the Q3 structure is barely desorbed. In this study, incomplete elution of silicic acid from OH- type resin columns has been found to be caused by polymerization of adsorbed silicic acid and the elution behavior may depend on the polymerization mode.

元の言語英語
ページ(範囲)869-874
ページ数6
ジャーナルBulletin of the Chemical Society of Japan
92
発行部数4
DOI
出版物ステータス出版済み - 1 1 2019

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Silicic Acid
Anion Exchange Resins
Polymerization
Acids
Desorption
Ion exchange
Resins
hydroxide ion

All Science Journal Classification (ASJC) codes

  • Chemistry(all)

これを引用

Inhibition of silicic acid elution during the regeneration of strong base anion exchange resin column. / Chuuman, Takaaki; Eguchi, Kinnosuke; Akinaga, Marina; Kawamoto, Daisuke; Horii, Shigeki; Yonezu, Kotaro; Watanabe, Koichiro; Yokoyama, Takushi.

:: Bulletin of the Chemical Society of Japan, 巻 92, 番号 4, 01.01.2019, p. 869-874.

研究成果: ジャーナルへの寄稿記事

Chuuman, Takaaki ; Eguchi, Kinnosuke ; Akinaga, Marina ; Kawamoto, Daisuke ; Horii, Shigeki ; Yonezu, Kotaro ; Watanabe, Koichiro ; Yokoyama, Takushi. / Inhibition of silicic acid elution during the regeneration of strong base anion exchange resin column. :: Bulletin of the Chemical Society of Japan. 2019 ; 巻 92, 番号 4. pp. 869-874.
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abstract = "To determine why silicic acid elution is often incomplete during regeneration of strong base anion exchange resin columns, an OH- type anion exchange resin (OH- type resin) adsorbing silicic acid was prepared and the desorption (elution) behavior of silicic acid adsorbed to the resin was examined by batch and column experiments. It was first found that silicic acid adsorbed to an OH- type resin polymerizes to form polysilicic acids (Q1, Q2 and Q3 structures) even when a smaller amount of silicic acid than the ion exchange capacity was adsorbed (unsaturated adsorption). Consequently, elution of silicic acid from the OH- type resin column is most likely caused by hydrolytic decomposition of polysilicic acid. Silicic acids with Q0, Q1 and Q2 structures can be easily desorbed from the OH- type resin by immersing them in a 1{\%} NaOH solution for 5min. On the other hand, silicic acid with the Q3 structure is barely desorbed. In this study, incomplete elution of silicic acid from OH- type resin columns has been found to be caused by polymerization of adsorbed silicic acid and the elution behavior may depend on the polymerization mode.",
author = "Takaaki Chuuman and Kinnosuke Eguchi and Marina Akinaga and Daisuke Kawamoto and Shigeki Horii and Kotaro Yonezu and Koichiro Watanabe and Takushi Yokoyama",
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AU - Chuuman, Takaaki

AU - Eguchi, Kinnosuke

AU - Akinaga, Marina

AU - Kawamoto, Daisuke

AU - Horii, Shigeki

AU - Yonezu, Kotaro

AU - Watanabe, Koichiro

AU - Yokoyama, Takushi

PY - 2019/1/1

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N2 - To determine why silicic acid elution is often incomplete during regeneration of strong base anion exchange resin columns, an OH- type anion exchange resin (OH- type resin) adsorbing silicic acid was prepared and the desorption (elution) behavior of silicic acid adsorbed to the resin was examined by batch and column experiments. It was first found that silicic acid adsorbed to an OH- type resin polymerizes to form polysilicic acids (Q1, Q2 and Q3 structures) even when a smaller amount of silicic acid than the ion exchange capacity was adsorbed (unsaturated adsorption). Consequently, elution of silicic acid from the OH- type resin column is most likely caused by hydrolytic decomposition of polysilicic acid. Silicic acids with Q0, Q1 and Q2 structures can be easily desorbed from the OH- type resin by immersing them in a 1% NaOH solution for 5min. On the other hand, silicic acid with the Q3 structure is barely desorbed. In this study, incomplete elution of silicic acid from OH- type resin columns has been found to be caused by polymerization of adsorbed silicic acid and the elution behavior may depend on the polymerization mode.

AB - To determine why silicic acid elution is often incomplete during regeneration of strong base anion exchange resin columns, an OH- type anion exchange resin (OH- type resin) adsorbing silicic acid was prepared and the desorption (elution) behavior of silicic acid adsorbed to the resin was examined by batch and column experiments. It was first found that silicic acid adsorbed to an OH- type resin polymerizes to form polysilicic acids (Q1, Q2 and Q3 structures) even when a smaller amount of silicic acid than the ion exchange capacity was adsorbed (unsaturated adsorption). Consequently, elution of silicic acid from the OH- type resin column is most likely caused by hydrolytic decomposition of polysilicic acid. Silicic acids with Q0, Q1 and Q2 structures can be easily desorbed from the OH- type resin by immersing them in a 1% NaOH solution for 5min. On the other hand, silicic acid with the Q3 structure is barely desorbed. In this study, incomplete elution of silicic acid from OH- type resin columns has been found to be caused by polymerization of adsorbed silicic acid and the elution behavior may depend on the polymerization mode.

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