Intensity-modulated excimer laser annealing to obtain (001) surface-oriented poly-si films on glass: Molecular dynamics study

Norie Matsubara, Tomohiko Ogata, Takanori Mitani, Shinji Munetoh, Teruaki Motooka

    研究成果: Chapter in Book/Report/Conference proceedingConference contribution

    抄録

    We have investigated the dependence of the melting and crystal growth rates on the crystal orientations at solid/liquid (s/l) silicon (Si) interfaces by molecular dynamics (MD) simulations. It was found that there was no appreciable difference in the melting rates in all crystal orientations, though the growth rate at Si(001)/l-Si was the largest in all crystal orientations. We have also performed MD simulations of intensity-modulated excimer laser annealing (IMELA) of Si thin films. These results suggest that (001) surface-oriented Si can be obtained by IMELA owing to the largest growth rate at Si(001)/l-Si of all in the repetitions of crystallization and melting.

    本文言語英語
    ホスト出版物のタイトルMaterials Research Society Symposium Proceedings - Artificially Induced Grain Alignment in Thin Films
    ページ173-178
    ページ数6
    出版ステータス出版済み - 12 1 2009
    イベント2008 MRS Fall Meeting - Boston, MA, 米国
    継続期間: 12 2 200812 4 2008

    出版物シリーズ

    名前Materials Research Society Symposium Proceedings
    1150
    ISSN(印刷版)0272-9172

    その他

    その他2008 MRS Fall Meeting
    Country米国
    CityBoston, MA
    Period12/2/0812/4/08

    All Science Journal Classification (ASJC) codes

    • Materials Science(all)
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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