Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.

元の言語英語
ホスト出版物のタイトル16th International Conference on Nanotechnology - IEEE NANO 2016
出版者Institute of Electrical and Electronics Engineers Inc.
ページ671-673
ページ数3
ISBN(電子版)9781509039142
DOI
出版物ステータス出版済み - 11 21 2016
イベント16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 - Sendai, 日本
継続期間: 8 22 20168 25 2016

出版物シリーズ

名前16th International Conference on Nanotechnology - IEEE NANO 2016

その他

その他16th IEEE International Conference on Nanotechnology - IEEE NANO 2016
日本
Sendai
期間8/22/168/25/16

Fingerprint

Plasma sheaths
Plasmas
plasma potentials
plasma sheaths
collisions
sensitivity

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

これを引用

Soejima, M., Koga, K., & Shiratani, M. (2016). Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. : 16th International Conference on Nanotechnology - IEEE NANO 2016 (pp. 671-673). [7751376] (16th International Conference on Nanotechnology - IEEE NANO 2016). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NANO.2016.7751376

Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. / Soejima, Masahiro; Koga, Kazunori; Shiratani, Masaharu.

16th International Conference on Nanotechnology - IEEE NANO 2016. Institute of Electrical and Electronics Engineers Inc., 2016. p. 671-673 7751376 (16th International Conference on Nanotechnology - IEEE NANO 2016).

研究成果: 著書/レポートタイプへの貢献会議での発言

Soejima, M, Koga, K & Shiratani, M 2016, Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. : 16th International Conference on Nanotechnology - IEEE NANO 2016., 7751376, 16th International Conference on Nanotechnology - IEEE NANO 2016, Institute of Electrical and Electronics Engineers Inc., pp. 671-673, 16th IEEE International Conference on Nanotechnology - IEEE NANO 2016, Sendai, 日本, 8/22/16. https://doi.org/10.1109/NANO.2016.7751376
Soejima M, Koga K, Shiratani M. Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. : 16th International Conference on Nanotechnology - IEEE NANO 2016. Institute of Electrical and Electronics Engineers Inc. 2016. p. 671-673. 7751376. (16th International Conference on Nanotechnology - IEEE NANO 2016). https://doi.org/10.1109/NANO.2016.7751376
Soejima, Masahiro ; Koga, Kazunori ; Shiratani, Masaharu. / Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas. 16th International Conference on Nanotechnology - IEEE NANO 2016. Institute of Electrical and Electronics Engineers Inc., 2016. pp. 671-673 (16th International Conference on Nanotechnology - IEEE NANO 2016).
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