Inter-particle potential fluctuation of two fine particles suspended in Ar plasmas

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

We have analyzed inter-particle potential during binary collision of two fine particles suspended at the plasma/sheath boundary. For this analysis, we have employed a tracking analysis which gives time evolution of the particle position automatically from the movie of particle behavior. The fluctuation of inter-particle potential is originated from a major component of the plasma potential fluctuation and minor one of the particle charge fluctuation. The tracking analysis of fine particles is a promising method to provide fluctuation of plasma potential with ultrahigh sensitivity at a local position.

本文言語英語
ホスト出版物のタイトル16th International Conference on Nanotechnology - IEEE NANO 2016
出版社Institute of Electrical and Electronics Engineers Inc.
ページ671-673
ページ数3
ISBN(電子版)9781509039142
DOI
出版ステータス出版済み - 11 21 2016
イベント16th IEEE International Conference on Nanotechnology - IEEE NANO 2016 - Sendai, 日本
継続期間: 8 22 20168 25 2016

出版物シリーズ

名前16th International Conference on Nanotechnology - IEEE NANO 2016

その他

その他16th IEEE International Conference on Nanotechnology - IEEE NANO 2016
Country日本
CitySendai
Period8/22/168/25/16

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

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