Interfacial observations of Ni/Ni3Si and Ni/Ni3Ga diffusion couples

Z. Horita, K. Fujiwara, Y. Ootoshi, N. Komai, M. Watanabe, M. Nemoto

    研究成果: Contribution to journalArticle査読

    5 被引用数 (Scopus)

    抄録

    Microstructural observations and selected-area electron diffraction analyses are conducted around the diffusion-couple interfaces of Ni/Ni3Si and Ni/Ni3Ga. The Ni-rich solid solution phase (γ phase) grows towards the Ni3Si- or Ni3Ga-based intermetallic phase (γ′ phase) during diffusion annealing and there exists the same crystallographic orientation relationship between the γ and γ′ phases. It is demonstrated that this growth process and structural faeatures are characteristic of the diffusion couples between pure Ni and Ni-based intermetallics with the Ll2-type crystal structure. It is shown that the focused-ion-beam cutting technique is a useful tool for preparing thin specimens for transmission electron microscopy.

    本文言語英語
    ページ(範囲)149-153
    ページ数5
    ジャーナルPhilosophical Magazine Letters
    75
    3
    DOI
    出版ステータス出版済み - 3 1997

    All Science Journal Classification (ASJC) codes

    • 凝縮系物理学

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