Interfacial structure of strong-segregated block copolymer thin film at high temperature

Naoya Torikai, Daisuke Kawaguchi, Atsushi Takano, Yushu Matsushita, Robert Dalgliesh, Sean Langridge

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

Interfacial structure of strong-segregated poly(styrene-d 8)-block-poly(2-vinylpyridine) diblock copolymer thin films with lamellar microdomain was investigated by neutron reflectivity (NR) measurement at different temperatures above Tg of the component polymer. The thin film specimens with different film thicknesses were prepared by spin-coating method, and then annealed at 170°C in vacuum during more than one week before NR measurement. The observed specular reflectivity profiles exhibit several Bragg peaks up to high order at 170°C, implying that lamellar structure keeps highly-ordered state and preferential orientation along the direction parallel to the film surface even at high temperature above T g. It was found that lamellar domain spacing (D) is increased with increasing temperature for a thinner film, while D is decreased for a thicker film. Further, it was found by a conventional model-fitting analysis of specular reflectivity that apparent interfacial thickness evaluated tends to be somewhat increased at high temperature.

本文言語英語
ホスト出版物のタイトル55th SPSJ Symposium on Macromolecules
ページ3476
ページ数1
55
2
出版ステータス出版済み - 2006
外部発表はい
イベント55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, 日本
継続期間: 9 20 20069 22 2006

その他

その他55th Society of Polymer Science Japan Symposium on Macromolecules
国/地域日本
CityToyama
Period9/20/069/22/06

All Science Journal Classification (ASJC) codes

  • 工学(全般)

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