Investigation of a step-like output energy decrease observed in an ArF excimer laser for microlithography

Akira Sumitani, Takanobu Ishihara, Teruaki Fukuoka, Kiichiro Uchino

研究成果: ジャーナルへの寄稿学術誌査読

2 被引用数 (Scopus)

抄録

A step-like decrease of the output energy of an ArF excimer laser for microlithography has been observed during high-repetition rate and high-power operation. The reason for the step-like energy decrease was traced to oxygen by adding 50ppm of various gas impurities to the laser gas. It is supposed that the energy decrease is caused by laser light absorption due to the oxygen or to some kinds of oxygen compounds because no change was observed in ArF and XeF emission intensities which were monitored as measures of excimer formation, Xe content, and discharge states.

本文言語英語
ページ(範囲)L1030-L1032
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
45
37-41
DOI
出版ステータス出版済み - 10月 2006

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(その他)
  • 物理学および天文学(全般)

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