Investigation on microstructures and growth mechanism of Y123 films deposited by advanced TFA-MOD method

J. S. Matsuda, Y. Tokunaga, R. Teranishi, H. Fuji, A. Kaneko, S. Asada, T. Honjo, A. Yajima, Y. Iijima, T. Saitoh, T. Izumi, Y. Shiohara

研究成果: Contribution to journalConference article査読

抄録

The microstructures and growth mechanism of Y123 films deposited by advanced metalorganic deposition using trifluoroacetates (TFA-MOD) method were investigated. The relationship of water partial pressure (PH2O) and microstructures of Y123 films, deposited by advanced TFA-MOD method, was studied to understand the mechanism of the microstructure evolution and to attain higher critical current (Ic). It was found that the growth rate of Y123 film is proportional to a square root of the PH2O in the crystallization process. The results show that after optimizing the time according to the relationship, the Ic has a dependency on PH 2O; Ic values become higher as PH2O increases.

本文言語英語
論文番号EE1.6
ページ(範囲)17-19
ページ数3
ジャーナルMaterials Research Society Symposium Proceedings
EXS
3
出版ステータス出版済み - 12 1 2004
外部発表はい
イベント2003 MRS Fall Meeting - Boston, MA, 米国
継続期間: 12 1 200312 4 2003

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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