The microstructures and growth mechanism of Y123 films deposited by advanced metalorganic deposition using trifluoroacetates (TFA-MOD) method were investigated. The relationship of water partial pressure (PH2O) and microstructures of Y123 films, deposited by advanced TFA-MOD method, was studied to understand the mechanism of the microstructure evolution and to attain higher critical current (Ic). It was found that the growth rate of Y123 film is proportional to a square root of the PH2O in the crystallization process. The results show that after optimizing the time according to the relationship, the Ic has a dependency on PH 2O; Ic values become higher as PH2O increases.
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