Laser-ablated plasma for deposition of ZnO thin films on various substrates

T. Ohshima, R. K. Thareja, Y. Yamagata, T. Ikegami, K. Ebihara, J. Narayan

研究成果: ジャーナルへの寄稿学術誌査読

21 被引用数 (Scopus)

抄録

We report optical and structural properties of ZnO films deposited by pulsed laser deposition technique on (100) n-type silicon and quartz substrates at various pressures of back ground gas. ZnO plasma was created using KrF laser (248 nm) at various pressures of the ambient gas, oxygen. Laser induced plasma at varying fluence on the target was investigated using optical emission spectroscopy and 2-D images of the expanding plumes. X-ray diffraction, atomic force microscopy, and spectro-photometry were used to characterize as grown films.

本文言語英語
ページ(範囲)517-523
ページ数7
ジャーナルScience and Technology of Advanced Materials
2
3-4
DOI
出版ステータス出版済み - 9月 12 2001
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 材料科学(全般)

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