Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources

D. Nakamura, H. Tanaka, Y. Hashimoto, K. Tamaru, A. Takahashi, T. Okada

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

In the development of extreme ultraviolet (EUV) light source for EUV lithography systems by laser-produced plasma (LPP), reduction of debris emitted from the plasma such as ions, droplets and neutral atoms is one of the most important factors. In our study, we developed a two-dimensional (2D) laser-induced fluorescence (LIF) imaging system for neutral atoms from the plasma and investigated neutral debris behaviors in order to obtain the guideline for the optimization of debris shields. Dependence of atomic emission on a thickness of LPP Sn target film was observed and the distributions of emitted neutral atoms in H2 gas were measured by 2D LIF system.

元の言語英語
ホスト出版物のタイトルPhoton Processing in Microelectronics and Photonics VI
DOI
出版物ステータス出版済み - 5 18 2007
イベントPhoton Processing in Microelectronics and Photonics VI - San Jose, CA, 米国
継続期間: 1 22 20071 25 2007

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
6458
ISSN(印刷物)0277-786X

その他

その他Photon Processing in Microelectronics and Photonics VI
米国
San Jose, CA
期間1/22/071/25/07

Fingerprint

Tin
neutral atoms
debris
Debris
Ultraviolet
ultraviolet radiation
Laser produced plasmas
Light sources
tin
Diagnostics
light sources
Extremes
Plasma
Imaging
Laser
Laser-produced Plasma
Plasmas
Laser-induced Fluorescence
Imaging techniques
laser plasmas

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Nakamura, D., Tanaka, H., Hashimoto, Y., Tamaru, K., Takahashi, A., & Okada, T. (2007). Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. : Photon Processing in Microelectronics and Photonics VI [645808] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 6458). https://doi.org/10.1117/12.698790

Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. / Nakamura, D.; Tanaka, H.; Hashimoto, Y.; Tamaru, K.; Takahashi, A.; Okada, T.

Photon Processing in Microelectronics and Photonics VI. 2007. 645808 (Proceedings of SPIE - The International Society for Optical Engineering; 巻 6458).

研究成果: 著書/レポートタイプへの貢献会議での発言

Nakamura, D, Tanaka, H, Hashimoto, Y, Tamaru, K, Takahashi, A & Okada, T 2007, Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. : Photon Processing in Microelectronics and Photonics VI., 645808, Proceedings of SPIE - The International Society for Optical Engineering, 巻. 6458, Photon Processing in Microelectronics and Photonics VI, San Jose, CA, 米国, 1/22/07. https://doi.org/10.1117/12.698790
Nakamura D, Tanaka H, Hashimoto Y, Tamaru K, Takahashi A, Okada T. Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. : Photon Processing in Microelectronics and Photonics VI. 2007. 645808. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.698790
Nakamura, D. ; Tanaka, H. ; Hashimoto, Y. ; Tamaru, K. ; Takahashi, A. ; Okada, T. / Laser-imaging diagnostics of debris behavior from laser-produced tin plasma for EUV light sources. Photon Processing in Microelectronics and Photonics VI. 2007. (Proceedings of SPIE - The International Society for Optical Engineering).
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