抄録
We prepared optical thin films grown with surface chemical reactions using TiCl4 and H2O for TiO2, Al(CH3)3 and H2O2 for Al2O3 as reactants. The uniformity of thickness distribution was good over 240 mm in diameter. The film thickness could be precisely controlled only by the number of cycles. Two-layer TiO2Al2O3 anti-reflection coating with less than 0.2% reflection loss at 532 nm was fabricated. Laser-induced damage thresholds strongly depended on the growth temperature and the introduced gas pressure. They increased with decreasing the growth temperature and with increasing the introduced gas pressure.
本文言語 | 英語 |
---|---|
ページ(範囲) | 204-211 |
ページ数 | 8 |
ジャーナル | Proceedings of SPIE - The International Society for Optical Engineering |
巻 | 3492 |
号 | I |
DOI | |
出版ステータス | 出版済み - 1999 |
外部発表 | はい |
イベント | Proceedings of the 1998 3rd International Conference on Solid State Lasers for Application to Inertial Confinement Fusion - Monterey, CA, USA 継続期間: 6月 7 1998 → 6月 12 1998 |
!!!All Science Journal Classification (ASJC) codes
- 電子材料、光学材料、および磁性材料
- 凝縮系物理学
- コンピュータ サイエンスの応用
- 応用数学
- 電子工学および電気工学