Localized intermittent electron flux in an ECR plasma

Shinji Yoshimura, Kenichiro Terasaka, Eiki Tanaka, Mitsutoshi Aramaki, Masayoshi Tanaka

    研究成果: ジャーナルへの寄稿記事

    2 引用 (Scopus)

    抄録

    Intermittent enhancement of local electron flux has recently been observed in a linear electron cyclotron resonance plasma. The aim of this paper is to measure the 2-D distribution of the electron flux, which appears at random positions in the plasma cross section, using intensified charge-coupled device imaging. A series of images of the emission from the Ne 2p 1 state is presented; it clearly demonstrates a circular region of enhanced excitation due to increase in the electron temperature.

    元の言語英語
    記事番号6856199
    ページ(範囲)2554-2555
    ページ数2
    ジャーナルIEEE Transactions on Plasma Science
    42
    発行部数10
    DOI
    出版物ステータス出版済み - 10 1 2014

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    electron flux
    electron cyclotron resonance
    charge coupled devices
    electron energy
    augmentation
    cross sections
    excitation

    All Science Journal Classification (ASJC) codes

    • Nuclear and High Energy Physics
    • Condensed Matter Physics

    これを引用

    Yoshimura, S., Terasaka, K., Tanaka, E., Aramaki, M., & Tanaka, M. (2014). Localized intermittent electron flux in an ECR plasma. IEEE Transactions on Plasma Science, 42(10), 2554-2555. [6856199]. https://doi.org/10.1109/TPS.2014.2329699

    Localized intermittent electron flux in an ECR plasma. / Yoshimura, Shinji; Terasaka, Kenichiro; Tanaka, Eiki; Aramaki, Mitsutoshi; Tanaka, Masayoshi.

    :: IEEE Transactions on Plasma Science, 巻 42, 番号 10, 6856199, 01.10.2014, p. 2554-2555.

    研究成果: ジャーナルへの寄稿記事

    Yoshimura, S, Terasaka, K, Tanaka, E, Aramaki, M & Tanaka, M 2014, 'Localized intermittent electron flux in an ECR plasma', IEEE Transactions on Plasma Science, 巻. 42, 番号 10, 6856199, pp. 2554-2555. https://doi.org/10.1109/TPS.2014.2329699
    Yoshimura, Shinji ; Terasaka, Kenichiro ; Tanaka, Eiki ; Aramaki, Mitsutoshi ; Tanaka, Masayoshi. / Localized intermittent electron flux in an ECR plasma. :: IEEE Transactions on Plasma Science. 2014 ; 巻 42, 番号 10. pp. 2554-2555.
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