Low-loss 60 GHz patterned ground shield CPW transmission line

D. A.A. Mat, R. K. Pokharel, R. Sapawi, H. Kanaya, K. Yoshida

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

5 被引用数 (Scopus)

抄録

This paper describes the slow wave structure design below the metallization plane to reduce dielectric loss of the silicon substrates. Three types of structure, floating strips with shield strip length (SL) = shield strip spacing (SS)=10μm and 5μm, and patterned ground with SL=SS=5μm have been designed for coplanar waveguide (CPW) transmission line using 0.18μm CMOS TSMC technology. These structures act to prevent the penetration of the electric field into the silicon substrate. It shows that at frequency of 60GHz, patterned ground shield resulted lower attenuation loss, approximately 60% lower compare to conventional CPW with the increase of quality factor to 16.006. The patterned structure exhibit the attenuation loss of 0.731dB/mm. The wavelength of the design is 980μm at 60GHz.

本文言語英語
ホスト出版物のタイトルTENCON 2011 - 2011 IEEE Region 10 Conference
ホスト出版物のサブタイトルTrends and Development in Converging Technology Towards 2020
ページ1118-1121
ページ数4
DOI
出版ステータス出版済み - 12 1 2011
イベント2011 IEEE Region 10 Conference: Trends and Development in Converging Technology Towards 2020, TENCON 2011 - Bali, インドネシア
継続期間: 11 21 201111 24 2011

出版物シリーズ

名前IEEE Region 10 Annual International Conference, Proceedings/TENCON

その他

その他2011 IEEE Region 10 Conference: Trends and Development in Converging Technology Towards 2020, TENCON 2011
国/地域インドネシア
CityBali
Period11/21/1111/24/11

All Science Journal Classification (ASJC) codes

  • コンピュータ サイエンスの応用
  • 電子工学および電気工学

フィンガープリント

「Low-loss 60 GHz patterned ground shield CPW transmission line」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル