Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano, Kosuke Kameyama, Kiichi Hamamoto

研究成果: 著書/レポートタイプへの貢献会議での発言

抜粋

SOI-based Si/SiO2 high-mesa waveguide has been fabricated by using neutral loop discharge (NLD) plasma etching. Significant loss reduction of about 50%, resulted in 0.3dB/cm propagation loss, has been achieved.

元の言語英語
ホスト出版物のタイトルIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
出版者Optical Society of America
ISBN(印刷物)1557528446, 9781557528445
出版物ステータス出版済み - 1 1 2007
イベントIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 - Salt Lake City, UT, 米国
継続期間: 7 8 20077 8 2007

出版物シリーズ

名前Optics InfoBase Conference Papers
ISSN(電子版)2162-2701

その他

その他Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007
米国
Salt Lake City, UT
期間7/8/077/8/07

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

フィンガープリント Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Yano, S., Kameyama, K., & Hamamoto, K. (2007). Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system. : Integrated Photonics and Nanophotonics Research and Applications, IPNRA 2007 (Optics InfoBase Conference Papers). Optical Society of America.