TY - JOUR
T1 - Low-Temperature Growth of Nanocrystalline Diamond by Reactive Pulsed Laser Deposition under a Hydrogen Atmosphere
AU - Yoshitake, Tsuyoshi
AU - Hara, Takeshi
AU - Fukugawa, Tomohito
AU - Zhu, Ling Yun
AU - Itakura, Masaru
AU - Kuwano, Noriyuki
AU - Tomokiyo, Yoshitsugu
AU - Nagayama, Kunihito
PY - 2004/2/15
Y1 - 2004/2/15
N2 - By reactive pulsed laser deposition under a hydrogen atmosphere, nanocrystalline diamond (NCD) films containing amorphous carbon were grown at a substrate temperature of 550°C. The deposition rate was 80nm/min. The transmission electron microscopy (TEM) observation showed that nonoriented nanocrystalline diamond films, whose crystallite diameters were 10-20nm, were grown at an optimum hydrogen pressure of 4 Torr. The deposited films had smooth surfaces on a nanoscale.
AB - By reactive pulsed laser deposition under a hydrogen atmosphere, nanocrystalline diamond (NCD) films containing amorphous carbon were grown at a substrate temperature of 550°C. The deposition rate was 80nm/min. The transmission electron microscopy (TEM) observation showed that nonoriented nanocrystalline diamond films, whose crystallite diameters were 10-20nm, were grown at an optimum hydrogen pressure of 4 Torr. The deposited films had smooth surfaces on a nanoscale.
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U2 - 10.1143/jjap.43.l240
DO - 10.1143/jjap.43.l240
M3 - Article
AN - SCOPUS:2142824282
SN - 0021-4922
VL - 43
SP - L240-L242
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
IS - 2 B
ER -