Low-temperature, high-concentration laser doping of 4H-SiC for low contact resistance

T. Kikuchi, K. Imokawa, Akihiro Ikeda, D. Nakamura, T. Asano, H. Ikenoue

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

抄録

We propose low-temperature and high-concentration doping of 4H-silicon carbide (4H-SiC)(0001) by KrF excimer laser irradiation of source films on a 4H-SiC substrate, in which a dopant atom is included. In n-type doping, a SiNx film with a thickness of 100 nm was deposited on an n-type 4H-SiC(0001) substrate by chemical vapor deposition. A gas supply nozzle for ambient environment control was installed to prevent oxidation of the SiC surface. High-concentration nitrogen doping (∼1 × 1021/cm3 at the surface) was achieved by laser ablation of the SiNx film. Al/Ti electrodes were formed on the doped area at a room temperature, and a contact resistance of 2.2 × 10-5 Ωi1/2ycm2 was obtained, which is sufficiently small for the backside contact resistance of Schottky barrier diodes. In p-type doping, an Al film with a thickness of 240 nm was deposited on a 4H-SiC substrate by sputtering deposition. After laser irradiation of the Al film in ambient Ar, high-concentration Al doping (∼1 × 1021/cm3 at the surface) was achieved. Al/Ti electrodes were formed on the doped area at a low temperature of 600 °C, and a contact resistance 1.9 × 10-4 Ωi1/2ycm2 was obtained. We conclude that low-temperature and high-concentration doping of 4H-SiC for low contact resistance can be achieved by laser ablation of the source films on the 4H-SiC substrate.

本文言語英語
ホスト出版物のタイトルLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV
編集者Tetsuya Makimura, Gediminas Raciukaitis, Carlos Molpeceres
出版社SPIE
ISBN(電子版)9781510624528
DOI
出版ステータス出版済み - 1 1 2019
イベントLaser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV 2019 - San Francisco, 米国
継続期間: 2 4 20192 6 2019

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
10905
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

会議

会議Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIV 2019
国/地域米国
CitySan Francisco
Period2/4/192/6/19

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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