TY - JOUR
T1 - Measurements of molecular densities in low pressure discharge plasmas using laser Raman scattering
AU - Song, Yi Bing
AU - Hirakawa, Yuichiro
AU - Uchino, Kiichiro
AU - Muraoka, Katsunori
AU - Sakoda, Tadanori
AU - Yanagishita, Koji
AU - Nakamura, Shizuo
PY - 1996
Y1 - 1996
N2 - The possibility of using Raman scattering as a method of molecular density measurements in low pressure discharge plasmas has been investigated. Firstly, the detection limit of Raman signal was examined in low pressure air. It was shown that the Raman scattering from nitrogen molecules was detectable down to 0.06 Pa (particle density of 1.4 × 1019 m-3) when a photon counting detection system was used. The method was then applied to detect methane and its reaction products in an electron cyclotron resonance plasma operated at a pressure of 50 Pa. Densities of CH4, C2H2, C2H6 and H2 were absolutely determined using the calibrated data of the optical system. Also, it was clearly demonstrated that the gas composition in the discharge was dependent on gas flow rate. These experimental results showed the usefulness of the method for quantitative measurements of molecular densities in processing plasmas.
AB - The possibility of using Raman scattering as a method of molecular density measurements in low pressure discharge plasmas has been investigated. Firstly, the detection limit of Raman signal was examined in low pressure air. It was shown that the Raman scattering from nitrogen molecules was detectable down to 0.06 Pa (particle density of 1.4 × 1019 m-3) when a photon counting detection system was used. The method was then applied to detect methane and its reaction products in an electron cyclotron resonance plasma operated at a pressure of 50 Pa. Densities of CH4, C2H2, C2H6 and H2 were absolutely determined using the calibrated data of the optical system. Also, it was clearly demonstrated that the gas composition in the discharge was dependent on gas flow rate. These experimental results showed the usefulness of the method for quantitative measurements of molecular densities in processing plasmas.
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U2 - 10.1143/jjap.35.5509
DO - 10.1143/jjap.35.5509
M3 - Article
AN - SCOPUS:0030264257
SN - 0021-4922
VL - 35
SP - 5509
EP - 5513
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 10
ER -