TY - JOUR
T1 - Measurements of spatial distributions of electron density and temperature of 450 MHz UHF plasma using laser Thomson scattering
AU - Pan, Yiming
AU - Tomita, Kentaro
AU - Kawai, Yoshinobu
AU - Matsukuma, Masaaki
AU - Uchino, Kiichiro
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2021/1
Y1 - 2021/1
N2 - A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was realized; the electron density n e is around (1.1-1.5) × 1018 m-3 and the electron temperature T e is around (1.7-2.1) eV. Radial profiles of n e and T e were obtained for different pressures and powers. In all the conditions explored, n e had a single-center-peak profile, while T e profiles were relatively flat along the electrode.
AB - A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was realized; the electron density n e is around (1.1-1.5) × 1018 m-3 and the electron temperature T e is around (1.7-2.1) eV. Radial profiles of n e and T e were obtained for different pressures and powers. In all the conditions explored, n e had a single-center-peak profile, while T e profiles were relatively flat along the electrode.
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U2 - 10.35848/1347-4065/abbb6b
DO - 10.35848/1347-4065/abbb6b
M3 - Article
AN - SCOPUS:85095110697
VL - 60
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
M1 - SAAB03
ER -