Measurements of spatial distributions of electron density and temperature of 450 MHz UHF plasma using laser Thomson scattering

Yiming Pan, Kentaro Tomita, Yoshinobu Kawai, Masaaki Matsukuma, Kiichiro Uchino

研究成果: ジャーナルへの寄稿学術誌査読

抄録

A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was realized; the electron density n e is around (1.1-1.5) × 1018 m-3 and the electron temperature T e is around (1.7-2.1) eV. Radial profiles of n e and T e were obtained for different pressures and powers. In all the conditions explored, n e had a single-center-peak profile, while T e profiles were relatively flat along the electrode.

本文言語英語
論文番号SAAB03
ジャーナルJapanese journal of applied physics
60
DOI
出版ステータス出版済み - 1月 2021

!!!All Science Journal Classification (ASJC) codes

  • 工学(全般)
  • 物理学および天文学(全般)

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