Mechanism behind the crack formation in hydrogen doping Cz-Si crystal growth

Wataru Sugimura, Kousuke Takata, Masaki Tanaka, Kenji Higashida

    研究成果: ジャーナルへの寄稿学術誌査読

    2 被引用数 (Scopus)

    抄録

    In this study, {100} cracks were found in Czochralski (Cz) silicon wafers grown in the atmosphere including hydrogen under the condition of a low Vc/Gc (Vc, growth rate; and Gc, temperature gradient) although the {100} plane is not a cleavage plane of silicon crystals. It was also found that dislocation clusters were associated with the as-grown defects. To reveal the mechanism behind the crack formation, the process of introducing interstitial and hydrogen atoms into a Cz-Si crystal upon solidification was imitated by applying ion irradiation into Cz silicon wafers under three different conditions: silicon ions and hydrogen ions, silicon ions only, and hydrogen ions only. In this case, {100} cracks were only found in the wafer irradiated with both silicon and hydrogen ions. This suggests that the existence of dislocations in silicon is necessary for crack formation. Density functional theory calculations showed that the cleavage energy was decreased by the arrangement of hydrogen atoms on a {100} plane of a silicon crystal, which can explain the formation of {100} cracks during solidification.

    本文言語英語
    ページ(範囲)1936-1942
    ページ数7
    ジャーナルMaterials Transactions
    60
    9
    DOI
    出版ステータス出版済み - 1月 1 2019

    !!!All Science Journal Classification (ASJC) codes

    • 材料科学(全般)
    • 凝縮系物理学
    • 材料力学
    • 機械工学

    フィンガープリント

    「Mechanism behind the crack formation in hydrogen doping Cz-Si crystal growth」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル