Micro-grid fabrication of fluorinated polyimide by using magnetically controlled reactive ion etching (MC-RIE)

Akinori Furuya, Fusao Shimokawa, Tohru Matsuura, Renshi Sawada

    研究成果: 書籍/レポート タイプへの寄稿会議への寄与

    14 被引用数 (Scopus)

    抄録

    A micro-grid consisting of 100-μm-high pole-shaped counter-electrode elements arranged like a pair of interleaved combs was fabricated using a fluorinated polyimide as structural material and metallization and lift-off using a ZnO sacrificial layer. Our research into the magnetically controlled reactive ion etching (MC-RIE) of fluorinated polyimide substrate has result in an etching selectivity of up to 2600. These conditions result in a smooth etched surface. Shaped constructions hundreds of micrometers high with a good perpendicular shape can be formed using MC-RIE technique for fluorinated polyimide micro-fabrication. Moreover, many kinds of 3-dimensional structural devices can be manufactured when this technology is combined to a lift-off method using a ZnO sacrificial layer.

    本文言語英語
    ホスト出版物のタイトルIEEE Micro Electro Mechanical Systems
    出版社Publ by IEEE
    ページ59-65
    ページ数7
    ISBN(印刷版)0780309588
    出版ステータス出版済み - 1月 1 1993
    イベントProceedings of the 1993 IEEE Micro Electro Mechanical Systems - MEMS - Fort Lauderdale, FL, USA
    継続期間: 2月 7 19932月 10 1993

    出版物シリーズ

    名前IEEE Micro Electro Mechanical Systems

    その他

    その他Proceedings of the 1993 IEEE Micro Electro Mechanical Systems - MEMS
    CityFort Lauderdale, FL, USA
    Period2/7/932/10/93

    !!!All Science Journal Classification (ASJC) codes

    • 制御およびシステム工学
    • 機械工学
    • 電子工学および電気工学

    フィンガープリント

    「Micro-grid fabrication of fluorinated polyimide by using magnetically controlled reactive ion etching (MC-RIE)」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

    引用スタイル