Micromachining of polydimethylsiloxane induced by laser plasma EUV light

S. Torii, T. Makimura, K. Okazaki, Daisuke Nakamura, Akihiko Takahashi, T. Okada, H. Niino, K. Murakami

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

Polydimethylsiloxane (PDMS) is fundamental materials in the field of biotechnology. Because of its biocompatibility, microfabricated PDMS sheets are applied to micro-reactors and microchips for cell culture. Conventionally, the microstructures were fabricated by means of cast or imprint using molds, however it is difficult to fabricate the structures at high aspect ratios such as through-holes/vertical channels. The fabrication of the high-aspect structures would enable us to stack sheets to realize 3D fluidic circuits. In order to achieve the micromachining, direct photo-ablation by short wavelength light is promising. In the previous works, we investigated ablation of transparent materials such as silica glass and poly(methyl methacrylate) induced by irradiation with laser plasma EUV light. We achieved smooth and fine nanomachining. In this work, we applied our technique to PDMS micromachining. We condensed the EUV light onto PDMS surfaces at high power density up to 10 8 W/cm2 using a Au coated ellipsoidal mirror. We found that PDMS sheet was ablated at a rate up to 440 nm/shot. It should be emphasized that through hole with a diameter of 1 μm was fabricated in a PDMS sheet with a thickness of 4 μm. Thus we demonstrated the micromachining of PDMS sheets using laser plasma EUV light.

元の言語英語
ホスト出版物のタイトルDamage to VUV, EUV, and X-Ray Optics III
DOI
出版物ステータス出版済み - 7 25 2011
イベントDamage to VUV, EUV, and X-Ray Optics III - Prague, チェコ共和国
継続期間: 4 18 20114 20 2011

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
8077
ISSN(印刷物)0277-786X

その他

その他Damage to VUV, EUV, and X-Ray Optics III
チェコ共和国
Prague
期間4/18/114/20/11

Fingerprint

Laser Plasma
Micromachining
Polydimethylsiloxane
micromachining
laser plasmas
Ablation
Plasmas
Lasers
Microreactor
Biotechnology
Cell Culture
ablation
fluidic circuits
Silica
Aspect Ratio
Irradiation
High Power
Microstructure
Fabrication
Mirror

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

これを引用

Torii, S., Makimura, T., Okazaki, K., Nakamura, D., Takahashi, A., Okada, T., ... Murakami, K. (2011). Micromachining of polydimethylsiloxane induced by laser plasma EUV light. : Damage to VUV, EUV, and X-Ray Optics III [807714] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 8077). https://doi.org/10.1117/12.887384

Micromachining of polydimethylsiloxane induced by laser plasma EUV light. / Torii, S.; Makimura, T.; Okazaki, K.; Nakamura, Daisuke; Takahashi, Akihiko; Okada, T.; Niino, H.; Murakami, K.

Damage to VUV, EUV, and X-Ray Optics III. 2011. 807714 (Proceedings of SPIE - The International Society for Optical Engineering; 巻 8077).

研究成果: 著書/レポートタイプへの貢献会議での発言

Torii, S, Makimura, T, Okazaki, K, Nakamura, D, Takahashi, A, Okada, T, Niino, H & Murakami, K 2011, Micromachining of polydimethylsiloxane induced by laser plasma EUV light. : Damage to VUV, EUV, and X-Ray Optics III., 807714, Proceedings of SPIE - The International Society for Optical Engineering, 巻. 8077, Damage to VUV, EUV, and X-Ray Optics III, Prague, チェコ共和国, 4/18/11. https://doi.org/10.1117/12.887384
Torii S, Makimura T, Okazaki K, Nakamura D, Takahashi A, Okada T その他. Micromachining of polydimethylsiloxane induced by laser plasma EUV light. : Damage to VUV, EUV, and X-Ray Optics III. 2011. 807714. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.887384
Torii, S. ; Makimura, T. ; Okazaki, K. ; Nakamura, Daisuke ; Takahashi, Akihiko ; Okada, T. ; Niino, H. ; Murakami, K. / Micromachining of polydimethylsiloxane induced by laser plasma EUV light. Damage to VUV, EUV, and X-Ray Optics III. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
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