Micropatterning of polymeric semiconductor by selective lift-off method using epoxy mold

Zhe Wang, Xinhong Yu, Rubo Xing, Yanchun Han, Atsushi Takahara

研究成果: Contribution to journalArticle

3 引用 (Scopus)

抜粋

A simple and efficient method for patterning polymeric semiconductors for applications in the field of organic electronics is proposed. The entire polymer layer, except for the desired pattern, is selectively lifted off from a flat poly(dimethylsiloxane) (PDMS) stamp surface by an epoxy mold with a relief pattern. This is advantageous because the elastic deformation of the PDMS stamp around protrusions of a patterned stamp under pressure can assist the plastic deformation of a polymer film along the pattern edges, yielding large area and high quality patterns, and the PDMS surface has low surface energy, which allows the easy removal of the polymer film.

元の言語英語
ページ(範囲)1958-1962
ページ数5
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
27
発行部数4
DOI
出版物ステータス出版済み - 8 14 2009

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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