Mn 2O 3 slurry reuse by circulation achieving high constant removal rate

Sadahiro Kishii, Ko Nakamura, Kenzo Hanawa, Satoru Watanabe, Yoshihiro Arimoto, Syuhei Kurokawa, Toshiro K. Doi

研究成果: ジャーナルへの寄稿記事

抄録

Fumed silica is widely used in SiO 2 chemical mechanical polishing (CMP). In semiconductor processes, only fresh slurry is used, and used slurry is disposed. Sustainable development demands a reduction in waste. Since reuse of slurry is effective for reducing the amount of used slurry generated, we investigated the reuse of Mn 2O 3 slurry and conventional fumed silica slurry. In both cases, abrasive concentration decreases as reuse time increases. The removal rate for Mn 2O 3 slurry maintains a value 4 times that of the conventional fumed silica slurry during slurry reuse, because the removal rate for Mn 2O 3 slurry is almost constant for solid concentrations between 1.0 and 10 wt %. Pad conditioning was not performed for Mn 2O 3 slurry. The removal rate for conventional slurry decreases as the number of times of reuse increases, even when pad conditioning is appropriately performed.

元の言語英語
記事番号04DB07
ジャーナルJapanese journal of applied physics
51
発行部数4 PART 2
DOI
出版物ステータス出版済み - 4 1 2012

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reuse
Silica
conditioning
silicon dioxide
Chemical mechanical polishing
Abrasives
Sustainable development
Semiconductor materials
abrasives
polishing

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Kishii, S., Nakamura, K., Hanawa, K., Watanabe, S., Arimoto, Y., Kurokawa, S., & Doi, T. K. (2012). Mn 2O 3 slurry reuse by circulation achieving high constant removal rate. Japanese journal of applied physics, 51(4 PART 2), [04DB07]. https://doi.org/10.1143/JJAP.51.04DB07

Mn 2O 3 slurry reuse by circulation achieving high constant removal rate. / Kishii, Sadahiro; Nakamura, Ko; Hanawa, Kenzo; Watanabe, Satoru; Arimoto, Yoshihiro; Kurokawa, Syuhei; Doi, Toshiro K.

:: Japanese journal of applied physics, 巻 51, 番号 4 PART 2, 04DB07, 01.04.2012.

研究成果: ジャーナルへの寄稿記事

Kishii, S, Nakamura, K, Hanawa, K, Watanabe, S, Arimoto, Y, Kurokawa, S & Doi, TK 2012, 'Mn 2O 3 slurry reuse by circulation achieving high constant removal rate', Japanese journal of applied physics, 巻. 51, 番号 4 PART 2, 04DB07. https://doi.org/10.1143/JJAP.51.04DB07
Kishii, Sadahiro ; Nakamura, Ko ; Hanawa, Kenzo ; Watanabe, Satoru ; Arimoto, Yoshihiro ; Kurokawa, Syuhei ; Doi, Toshiro K. / Mn 2O 3 slurry reuse by circulation achieving high constant removal rate. :: Japanese journal of applied physics. 2012 ; 巻 51, 番号 4 PART 2.
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