Moisture barrier properties of single-layer graphene deposited on Cu films for Cu metallization

Ploybussara Gomasang, Takumi Abe, Kenji Kawahara, Yoko Wasai, Nataliya Nabatova-Gabain, Nguyen Thanh Cuong, Hiroki Ago, Susumu Okada, Kazuyoshi Ueno

研究成果: Contribution to journalArticle

4 引用 (Scopus)

抜粋

The moisture barrier properties of large-grain single-layer graphene (SLG) deposited on a Cu(111)/sapphire substrate are demonstrated by comparing with the bare Cu(111) surface under an accelerated degradation test (ADT) at 85°C and 85% relative humidity (RH) for various durations. The change in surface color and the formation of Cu oxide are investigated by optical microscopy (OM) and X-ray photoelectron spectroscopy (XPS), respectively. First-principle simulation is performed to understand the mechanisms underlying the barrier properties of SLG against O diffusion. The correlation between Cu oxide thickness and SLG quality are also analyzed by spectroscopic ellipsometry (SE) measured on a non-uniform SLG film. SLG with large grains shows high performance in preventing the Cu oxidation due to moisture during ADT.

元の言語英語
記事番号04FC08
ジャーナルJapanese journal of applied physics
57
発行部数4
DOI
出版物ステータス出版済み - 4 2018

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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    Gomasang, P., Abe, T., Kawahara, K., Wasai, Y., Nabatova-Gabain, N., Cuong, N. T., Ago, H., Okada, S., & Ueno, K. (2018). Moisture barrier properties of single-layer graphene deposited on Cu films for Cu metallization. Japanese journal of applied physics, 57(4), [04FC08]. https://doi.org/10.7567/JJAP.57.04FC08