Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene

Kyota Miyamoto, Nao Hosaka, Motoyasu Kobayashi, Hideyuki Otsuka, Naoya Torikai, Atsushi Takahara

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

Organic-inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with polyhedral oligomeric silsesquioxane (POSS) end group, were prepared by nitroxide-mediated radical polymerization. PS-POSS thin films were spin-coated from its toluene solution onto acid-cleaned silicon wafers. After annealing at 393 K for 3 h, PS-POSS (Mn=2500, Mw/Mn=1.11; PS-POSS2.5k) thin film did not dewet at all, in contrast, the bare substrate was observed as a consequence of the complete dewetting of the pure PS (M n=2100, Mw/Mn=1.06; PS2.1k) film. Differential scanning calorimetric analysis showed that the glass transition temperature of PS-POSS2.5k was 348.1 K, which means a noticeable increase from that of PS2.1k. Rheological characterization of PS-POSS2.5k suggested that the introduction of POSS as the chain end group of PS delays the dynamics of the polymer chain in melt state. Furthermore, neutron reflectivity measurement revealed that the POSS moiety of PS-POSS formed enriched layer at the surface and interface of the film. The segregation of POSS, which changes the surface and interface free energy of the film, can be an important factor in the dewetting inhibition effect.

元の言語英語
ホスト出版物のタイトル55th SPSJ Symposium on Macromolecules
ページ5167-5168
ページ数2
55
エディション2
出版物ステータス出版済み - 2006
イベント55th Society of Polymer Science Japan Symposium on Macromolecules - Toyama, 日本
継続期間: 9 20 20069 22 2006

その他

その他55th Society of Polymer Science Japan Symposium on Macromolecules
日本
Toyama
期間9/20/069/22/06

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Polystyrenes
Agglomeration
Thin films
Polymers
Free radical polymerization
Silicon wafers
Free energy
Toluene
Neutrons
Annealing
Scanning
Acids
Substrates

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

Miyamoto, K., Hosaka, N., Kobayashi, M., Otsuka, H., Torikai, N., & Takahara, A. (2006). Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene. : 55th SPSJ Symposium on Macromolecules (2 版, 巻 55, pp. 5167-5168)

Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene. / Miyamoto, Kyota; Hosaka, Nao; Kobayashi, Motoyasu; Otsuka, Hideyuki; Torikai, Naoya; Takahara, Atsushi.

55th SPSJ Symposium on Macromolecules. 巻 55 2. 編 2006. p. 5167-5168.

研究成果: 著書/レポートタイプへの貢献会議での発言

Miyamoto, K, Hosaka, N, Kobayashi, M, Otsuka, H, Torikai, N & Takahara, A 2006, Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene. : 55th SPSJ Symposium on Macromolecules. 2 Edn, 巻. 55, pp. 5167-5168, 55th Society of Polymer Science Japan Symposium on Macromolecules, Toyama, 日本, 9/20/06.
Miyamoto K, Hosaka N, Kobayashi M, Otsuka H, Torikai N, Takahara A. Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene. : 55th SPSJ Symposium on Macromolecules. 2 版 巻 55. 2006. p. 5167-5168
Miyamoto, Kyota ; Hosaka, Nao ; Kobayashi, Motoyasu ; Otsuka, Hideyuki ; Torikai, Naoya ; Takahara, Atsushi. / Molecular aggregation structure and properties of silsesquioxane-terminated polystyrene. 55th SPSJ Symposium on Macromolecules. 巻 55 2. 版 2006. pp. 5167-5168
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