Multistep thickening of nafion thin films in water

Yudai Ogata, Daisuke Kawaguchi, Norifumi L. Yamada, Keiji Tanaka

研究成果: ジャーナルへの寄稿記事

28 引用 (Scopus)

抄録

Water sorption kinetics in thin Nafion films prepared on silver and silicon oxide substrates was examined by surface plasmon resonance and neutron reflectivity measurements. It was found that the films thickened in three regimes. The asymptotic swelling ratios in regimes I, II, and III were 1.05, 1.26, and 1.41, respectively. These values were independent of the substrate species and were coincident with the transition points of different hydration states in the bulk Nafion; water binding to sulfonic acid groups, the formation of sphere-like ionic clusters, and bridge formation between clusters. The swelling was much slower in thin films than in the bulk due to the mobility restriction of Nafion near the substrate.

元の言語英語
ページ(範囲)856-859
ページ数4
ジャーナルACS Macro Letters
2
発行部数10
DOI
出版物ステータス出版済み - 10 28 2013

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Thin films
Swelling
Water
Substrates
Silver oxides
Sulfonic Acids
Silicon oxides
Surface plasmon resonance
Hydration
Sorption
Neutrons
Kinetics
Acids
perfluorosulfonic acid

All Science Journal Classification (ASJC) codes

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

これを引用

Multistep thickening of nafion thin films in water. / Ogata, Yudai; Kawaguchi, Daisuke; Yamada, Norifumi L.; Tanaka, Keiji.

:: ACS Macro Letters, 巻 2, 番号 10, 28.10.2013, p. 856-859.

研究成果: ジャーナルへの寄稿記事

Ogata, Yudai ; Kawaguchi, Daisuke ; Yamada, Norifumi L. ; Tanaka, Keiji. / Multistep thickening of nafion thin films in water. :: ACS Macro Letters. 2013 ; 巻 2, 番号 10. pp. 856-859.
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