Nanoscale molecular patterning on artificially fabricated nanoscale structured Al surfaces

H. Kato, S. Takemura, S. Kimura, T. Okumura, D. Kobayakawa, Y. Watanabe, T. Sugiyama, T. Hiramatsu, N. Nanba, O. Nishikawa, M. Taniguchi

研究成果: Contribution to journalArticle査読

2 被引用数 (Scopus)

抄録

The surface of an Al plate was treated with a combination of chemical and electrochemical processes for fabrication of surface nanoscale structures on Al plates. Chemical treatments by using acetone and pure water under supersonic waves were conducted on an Al surface. Additional electrochemical process in H2SO4 solution created a finer and oriented nanoscale structure on the Al surface. DFM measurement clarified that the nanoscale highly oriented line-structure was successfully created on Al surface. The line distance was estimated approximately 30-40 nm. Molecular patterning on the highly oriented line-structure by copper phthalocyanine (CuPc) was also conducted. The CuPc molecules were put on the nanoscale structure by casting a toluene droplet containing CuPc. DFM and X-ray photoemission spectroscopy (XPS) measurements demonstrated that a molecular pattern that the groove channels were filled with CuPc molecules was fabricated.

本文言語英語
論文番号052018
ジャーナルJournal of Physics: Conference Series
100
PART 5
DOI
出版ステータス出版済み - 3 1 2008
外部発表はい

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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