Negative bias effects on deposition and mechanical properties of ultrananocrystalline diamond/amorphous carbon composite films deposited on cemented carbide substrates by coaxial arc plasma

Ali M. Ali, Mohamed Egiza, Koki Murasawa, Yasuo Fukui, Hidenobu Gonda, Masatoshi Sakurai, Tsuyoshi Yoshitake

研究成果: ジャーナルへの寄稿記事

抄録

Ultrananocrystalline diamond/amorphous carbon composite (UNCD/a-C) films were deposited on negatively biased cemented carbide (WC-Co) substrates by coaxial arc plasma deposition. The deposition rate is increased to be 0.9 nm/s, which is approximately 3 times larger than that of films deposited under no bias condition. In addition, the critical load in scratch tests was enhanced to be 31 N, which is 4 times more than that of the no bias films. On the other hand, the hardness was slightly degraded by employing the negative bias. From electrical diagnostics of the bias application, it was found that the negative bias is immediately compensated by the arrival of highly-dense positive carbon ions at the substrate and the substrate is weakly positively charged after the compensation. This might be the main reason for the degraded hardness by the bias application, Since the positive bias deaccelerate carbon ions, which facilities the formation of sp2 bonds.

元の言語英語
ページ(範囲)67-73
ページ数7
ジャーナルDiamond and Related Materials
96
DOI
出版物ステータス出版済み - 6 1 2019

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Diamond
Carbon films
Amorphous carbon
Composite films
carbides
plasma jets
Carbides
Diamonds
diamonds
mechanical properties
Plasmas
Mechanical properties
composite materials
carbon
Substrates
Carbon
Hardness
Ions
Plasma deposition
Deposition rates

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

これを引用

Negative bias effects on deposition and mechanical properties of ultrananocrystalline diamond/amorphous carbon composite films deposited on cemented carbide substrates by coaxial arc plasma. / Ali, Ali M.; Egiza, Mohamed; Murasawa, Koki; Fukui, Yasuo; Gonda, Hidenobu; Sakurai, Masatoshi; Yoshitake, Tsuyoshi.

:: Diamond and Related Materials, 巻 96, 01.06.2019, p. 67-73.

研究成果: ジャーナルへの寄稿記事

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abstract = "Ultrananocrystalline diamond/amorphous carbon composite (UNCD/a-C) films were deposited on negatively biased cemented carbide (WC-Co) substrates by coaxial arc plasma deposition. The deposition rate is increased to be 0.9 nm/s, which is approximately 3 times larger than that of films deposited under no bias condition. In addition, the critical load in scratch tests was enhanced to be 31 N, which is 4 times more than that of the no bias films. On the other hand, the hardness was slightly degraded by employing the negative bias. From electrical diagnostics of the bias application, it was found that the negative bias is immediately compensated by the arrival of highly-dense positive carbon ions at the substrate and the substrate is weakly positively charged after the compensation. This might be the main reason for the degraded hardness by the bias application, Since the positive bias deaccelerate carbon ions, which facilities the formation of sp2 bonds.",
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T1 - Negative bias effects on deposition and mechanical properties of ultrananocrystalline diamond/amorphous carbon composite films deposited on cemented carbide substrates by coaxial arc plasma

AU - Ali, Ali M.

AU - Egiza, Mohamed

AU - Murasawa, Koki

AU - Fukui, Yasuo

AU - Gonda, Hidenobu

AU - Sakurai, Masatoshi

AU - Yoshitake, Tsuyoshi

PY - 2019/6/1

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N2 - Ultrananocrystalline diamond/amorphous carbon composite (UNCD/a-C) films were deposited on negatively biased cemented carbide (WC-Co) substrates by coaxial arc plasma deposition. The deposition rate is increased to be 0.9 nm/s, which is approximately 3 times larger than that of films deposited under no bias condition. In addition, the critical load in scratch tests was enhanced to be 31 N, which is 4 times more than that of the no bias films. On the other hand, the hardness was slightly degraded by employing the negative bias. From electrical diagnostics of the bias application, it was found that the negative bias is immediately compensated by the arrival of highly-dense positive carbon ions at the substrate and the substrate is weakly positively charged after the compensation. This might be the main reason for the degraded hardness by the bias application, Since the positive bias deaccelerate carbon ions, which facilities the formation of sp2 bonds.

AB - Ultrananocrystalline diamond/amorphous carbon composite (UNCD/a-C) films were deposited on negatively biased cemented carbide (WC-Co) substrates by coaxial arc plasma deposition. The deposition rate is increased to be 0.9 nm/s, which is approximately 3 times larger than that of films deposited under no bias condition. In addition, the critical load in scratch tests was enhanced to be 31 N, which is 4 times more than that of the no bias films. On the other hand, the hardness was slightly degraded by employing the negative bias. From electrical diagnostics of the bias application, it was found that the negative bias is immediately compensated by the arrival of highly-dense positive carbon ions at the substrate and the substrate is weakly positively charged after the compensation. This might be the main reason for the degraded hardness by the bias application, Since the positive bias deaccelerate carbon ions, which facilities the formation of sp2 bonds.

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