Novel fabrication method of ZnO films utilizing solid-phase crystallized seed layers

Naho Itagaki, Kazunari Kuwahara

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

6 被引用数 (Scopus)

抄録

A novel fabrication method of ZnO films utilizing solid-phase crystallized seed layers has been developed. In this method, solid phase crystallization (SPC) is performed by annealing amorphous ZnON films, which are prepared by sputtering of ZnO targets in Ar/N 2 mixed gases, in an oxidization atmosphere. The grain size of ZnO films deposited on the seed layers is significant larger than that of ZnO films directly deposited on glass substrates, which is considered to be due to the low grain density of seed layers. By utilizing this technique, the resistivity of ZnO:Al (AZO) films is decreased from 20× 10 -4 Ω cm to 5 × 10 -4 Ω cm at the film thickness of 30nm. Furthermore, we observed that SPC seed layers are in-plane aligned when Al 2O 3 substrates are used, which suggests that the fabrication method proposed here is also promising for synthesizing epitaxial ZnO films.

本文言語英語
ホスト出版物のタイトルTransparent Conducting Oxides and Applications
ページ15-20
ページ数6
DOI
出版ステータス出版済み - 1 1 2012
イベント2010 MRS Fall Meeting - Boston, MA, 米国
継続期間: 11 29 201012 3 2010

出版物シリーズ

名前Materials Research Society Symposium Proceedings
1315
ISSN(印刷版)0272-9172

その他

その他2010 MRS Fall Meeting
Country米国
CityBoston, MA
Period11/29/1012/3/10

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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