Novel nanofabrication based on wet nanocoating.(1)- Fabrication of sub-20 nm line array e

Shigenori Fujikawa, Rie Takaki, Toyoki Kunitake

研究成果: 会議への寄与タイプ論文

抜粋

We report herein fabrication of arrays of 20 nm silica wall with high aspect ratio via photolithography and the surface sol-gel process. The photolithographycally-fabricated line template on silicon wafer was coated with silica nanolayer by the surface sol-gel process, and the topmost portion of the silica layer and the template was successively removed by CHF3 and oxygen plasma treatment in this order to leave the sidewall of the silica layer on the substrate. The width of as-prepared wall depended on the cycle of the surface sol-gel process, and the thickness of silica wall was only 8 nm at 30 cycles. The height/width ratio of the wall is surprisingly high compared to that of the current lithography processes. The reported method is simple, practical and cost-efficient, and it opens a gateway to further miniaturization of nanostructures.

元の言語英語
ページ数1
出版物ステータス出版済み - 10 19 2006
外部発表Yes
イベント55th SPSJ Annual Meeting - Nagoya, 日本
継続期間: 5 24 20065 26 2006

その他

その他55th SPSJ Annual Meeting
日本
Nagoya
期間5/24/065/26/06

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Engineering(all)

これを引用

Fujikawa, S., Takaki, R., & Kunitake, T. (2006). Novel nanofabrication based on wet nanocoating.(1)- Fabrication of sub-20 nm line array e. 論文発表場所 55th SPSJ Annual Meeting, Nagoya, 日本.