Novel ultra-lightweight and high-resolution MEMS X-ray optics

Ikuyuki Mitsuishi, Yuichiro Ezoe, Utako Takagi, Makoto Mita, Raul Riveros, Hitomi Yamaguchi, Fumiki Kato, Susumu Sugiyama, Kouzou Fujiwara, Kohei Morishita, Kazuo Nakajima, Shinya Fujihira, Yoshiaki Kanamori, Noriko Y. Yamasaki, Kazuhisa Mitsuda, Ryutaro Maeda

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

10 被引用数 (Scopus)

抄録

We have been developing ultra light-weight X-ray optics using MEMS (Micro Electro Mechanical Systems) technologies.We utilized crystal planes after anisotropic wet etching of silicon (110) wafers as X-ray mirrors and succeeded in X-ray reflection and imaging. Since we can etch tiny pores in thin wafers, this type of optics can be the lightest X-ray telescope. However, because the crystal planes are alinged in certain directions, we must approximate ideal optical surfaces with flat planes, which limits angular resolution of the optics on the order of arcmin. In order to overcome this issue, we propose novel X-ray optics based on a combination of five recently developed MEMS technologies, namely silicon dry etching, X-ray LIGA, silicon hydrogen anneal, magnetic fluid assisted polishing and hot plastic deformation of silicon. In this paper, we describe this new method and report on our development of X-ray mirrors fabricated by these technologies and X-ray reflection experiments of two types of MEMS X-ray mirrors made of silicon and nickel. For the first time, X-ray reflections on these mirrors were detected in the angular response measurements. Compared to model calculations, surface roughness of the silicon and nickel mirrors were estimated to be 5 nm and 3 nm, respectively.

本文言語英語
ホスト出版物のタイトルEUV and X-Ray Optics
ホスト出版物のサブタイトルSynergy between Laboratory and Space
DOI
出版ステータス出版済み - 2009
外部発表はい
イベントEUV and X-Ray Optics: Synergy between Laboratory and Space - Prague, チェコ共和国
継続期間: 4 20 20094 22 2009

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
7360
ISSN(印刷版)0277-786X

その他

その他EUV and X-Ray Optics: Synergy between Laboratory and Space
Countryチェコ共和国
CityPrague
Period4/20/094/22/09

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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