Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass: A molecular-dynamics study

Shinji Munetoh, Takanori Mitani, Takahide Kuranaga, Teruaki Motooka

研究成果: 著書/レポートタイプへの貢献会議での発言

抄録

We have performed molecular-dynamics simulations of heating, melting and recrystallization processes in amorphous silicon (a-Si) thin films deposited on glass during excimer laser annealing. By partially heating the a-Si surface region with 2 nm depth and removing the thermal energy from the bottom of the glass substrate, a steady-state temperature profile was obtained in the a-Si layer with the thickness of 15 nm and only the surface region was melted. It was found that the nucleation predominantly occurred in the u-Si region as judged by the coordination numbers and diffusion constants of atoms in the region, The results suggest that the nucleation occurs in the unmelted residual a-Si region during the laser irradiation and then the crystal growth proceeds toward liquid Si region under the near-complete melting condition.

元の言語英語
ホスト出版物のタイトルGroup IV Semiconductor Nanostructures-2006
ページ159-164
ページ数6
出版物ステータス出版済み - 7 4 2007
イベント2006 MRS Fall Meeting - Boston, MA, 米国
継続期間: 11 27 200612 1 2006

出版物シリーズ

名前Materials Research Society Symposium Proceedings
958
ISSN(印刷物)0272-9172

その他

その他2006 MRS Fall Meeting
米国
Boston, MA
期間11/27/0612/1/06

Fingerprint

laser annealing
Amorphous silicon
amorphous silicon
Molecular dynamics
Nucleation
nucleation
Annealing
molecular dynamics
Glass
Thin films
Lasers
glass
thin films
Melting
melting
Heating
Glass lasers
heating
glass lasers
Excimer lasers

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

これを引用

Munetoh, S., Mitani, T., Kuranaga, T., & Motooka, T. (2007). Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass: A molecular-dynamics study. : Group IV Semiconductor Nanostructures-2006 (pp. 159-164). (Materials Research Society Symposium Proceedings; 巻数 958).

Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass : A molecular-dynamics study. / Munetoh, Shinji; Mitani, Takanori; Kuranaga, Takahide; Motooka, Teruaki.

Group IV Semiconductor Nanostructures-2006. 2007. p. 159-164 (Materials Research Society Symposium Proceedings; 巻 958).

研究成果: 著書/レポートタイプへの貢献会議での発言

Munetoh, S, Mitani, T, Kuranaga, T & Motooka, T 2007, Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass: A molecular-dynamics study. : Group IV Semiconductor Nanostructures-2006. Materials Research Society Symposium Proceedings, 巻. 958, pp. 159-164, 2006 MRS Fall Meeting, Boston, MA, 米国, 11/27/06.
Munetoh S, Mitani T, Kuranaga T, Motooka T. Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass: A molecular-dynamics study. : Group IV Semiconductor Nanostructures-2006. 2007. p. 159-164. (Materials Research Society Symposium Proceedings).
Munetoh, Shinji ; Mitani, Takanori ; Kuranaga, Takahide ; Motooka, Teruaki. / Nucleation process during exclmer laser annealing of amorphous silicon thin films on glass : A molecular-dynamics study. Group IV Semiconductor Nanostructures-2006. 2007. pp. 159-164 (Materials Research Society Symposium Proceedings).
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