Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization

Takayuki Watanabe, Noriaki Sugimoto

研究成果: ジャーナルへの寄稿Conference article

19 引用 (Scopus)

抜粋

Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas.

元の言語英語
ページ(範囲)201-208
ページ数8
ジャーナルThin Solid Films
457
発行部数1
DOI
出版物ステータス出版済み - 6 1 2004
外部発表Yes
イベント16th Symposium on Plasma Science for Materials (SPSM-16) - Tokyo, 日本
継続期間: 6 4 20036 5 2003

    フィンガープリント

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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