Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures

Hiroshi Muta, Mayuko Koga, Naho Itagaki, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿記事

11 引用 (Scopus)

抄録

In general, electron temperature is an important plasma parameter which has much influence in the film property. In this paper, the mechanism for decreasing the electron temperature in an electron cyclotron resonance plasma is numerically investigated using a fluid model. A mixture of argon and nitrogen is used as the working gas under the assumption of plasma nitridation. The simulation was carried out with typical magnetic field configurations and various mixture ratios. As a result, it was found that the application of magnetic mirror was suitable for the production of a low-electron-temperature plasma. Besides, the calculation results indicated that the addition of nitrogen was effective to decrease the electron temperature approximately 2 eV due to the vibrational excitation of nitrogen molecules by electron impact.

元の言語英語
ページ(範囲)157-161
ページ数5
ジャーナルSurface and Coatings Technology
171
発行部数1-3
DOI
出版物ステータス出版済み - 7 1 2003

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Electron temperature
electron energy
Plasmas
Nitrogen
nitrogen
Magnetic mirrors
magnetic mirrors
magnetic field configurations
Electron cyclotron resonance
Nitridation
Argon
electron cyclotron resonance
electron impact
Gases
argon
Magnetic fields
Molecules
Fluids
Electrons
fluids

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

これを引用

Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures. / Muta, Hiroshi; Koga, Mayuko; Itagaki, Naho; Kawai, Yoshinobu.

:: Surface and Coatings Technology, 巻 171, 番号 1-3, 01.07.2003, p. 157-161.

研究成果: ジャーナルへの寄稿記事

Muta, Hiroshi ; Koga, Mayuko ; Itagaki, Naho ; Kawai, Yoshinobu. / Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures. :: Surface and Coatings Technology. 2003 ; 巻 171, 番号 1-3. pp. 157-161.
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