抄録
In general, electron temperature is an important plasma parameter which has much influence in the film property. In this paper, the mechanism for decreasing the electron temperature in an electron cyclotron resonance plasma is numerically investigated using a fluid model. A mixture of argon and nitrogen is used as the working gas under the assumption of plasma nitridation. The simulation was carried out with typical magnetic field configurations and various mixture ratios. As a result, it was found that the application of magnetic mirror was suitable for the production of a low-electron-temperature plasma. Besides, the calculation results indicated that the addition of nitrogen was effective to decrease the electron temperature approximately 2 eV due to the vibrational excitation of nitrogen molecules by electron impact.
| 元の言語 | 英語 |
|---|---|
| ページ（範囲） | 157-161 |
| ページ数 | 5 |
| ジャーナル | Surface and Coatings Technology |
| 巻 | 171 |
| 発行部数 | 1-3 |
| DOI | |
| 出版物ステータス | 出版済み - 7 1 2003 |
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All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry
これを引用
Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures. / Muta, Hiroshi; Koga, Mayuko; Itagaki, Naho; Kawai, Yoshinobu.
：: Surface and Coatings Technology, 巻 171, 番号 1-3, 01.07.2003, p. 157-161.研究成果: ジャーナルへの寄稿 › 記事
}
TY - JOUR
T1 - Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures
AU - Muta, Hiroshi
AU - Koga, Mayuko
AU - Itagaki, Naho
AU - Kawai, Yoshinobu
PY - 2003/7/1
Y1 - 2003/7/1
N2 - In general, electron temperature is an important plasma parameter which has much influence in the film property. In this paper, the mechanism for decreasing the electron temperature in an electron cyclotron resonance plasma is numerically investigated using a fluid model. A mixture of argon and nitrogen is used as the working gas under the assumption of plasma nitridation. The simulation was carried out with typical magnetic field configurations and various mixture ratios. As a result, it was found that the application of magnetic mirror was suitable for the production of a low-electron-temperature plasma. Besides, the calculation results indicated that the addition of nitrogen was effective to decrease the electron temperature approximately 2 eV due to the vibrational excitation of nitrogen molecules by electron impact.
AB - In general, electron temperature is an important plasma parameter which has much influence in the film property. In this paper, the mechanism for decreasing the electron temperature in an electron cyclotron resonance plasma is numerically investigated using a fluid model. A mixture of argon and nitrogen is used as the working gas under the assumption of plasma nitridation. The simulation was carried out with typical magnetic field configurations and various mixture ratios. As a result, it was found that the application of magnetic mirror was suitable for the production of a low-electron-temperature plasma. Besides, the calculation results indicated that the addition of nitrogen was effective to decrease the electron temperature approximately 2 eV due to the vibrational excitation of nitrogen molecules by electron impact.
UR - http://www.scopus.com/inward/record.url?scp=0037904156&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0037904156&partnerID=8YFLogxK
U2 - 10.1016/S0257-8972(03)00261-5
DO - 10.1016/S0257-8972(03)00261-5
M3 - Article
AN - SCOPUS:0037904156
VL - 171
SP - 157
EP - 161
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - 1-3
ER -