Numerical investigation of the production mechanism of a low-temperature electron cyclotron resonance plasma

Hiroshi Muta, Naho Itagaki, Yoshinobu Kawai

研究成果: ジャーナルへの寄稿学術誌査読

9 被引用数 (Scopus)

抄録

The mechanism to decrease the electron temperature in an electron cyclotron resonance (ECR) plasma was numerically investigated using a fluid model. A mixture of argon and nitrogen was used as the working gas under the assumption of plasma nitriding by reactive sputtering. It was found that the power loss due to the vibrational excitation of nitrogen molecules by electron impact contributed to the decrease of electron temperature and the effect was promoted by the application of a mirror-type magnetic field configuration.

本文言語英語
ページ(範囲)209-214
ページ数6
ジャーナルVacuum
66
3-4
DOI
出版ステータス出版済み - 8月 19 2002
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜

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