Observation of SiO2 Nanoparticle Formation via UV Pulsed Laser Ablation in a Background Gas

Reiji Koike, Rio Suzuki, Keita Katayama, Mitsuhiro Higashihata, Hiroshi Ikenoue, Daisuke Nakamura

研究成果: ジャーナルへの寄稿学術誌査読

2 被引用数 (Scopus)

抄録

SiO2 nanoporous films have recently gained significant popularity as low-k dielectric constant insulating films. In this study, we demonstrated the fabrication of a low-k SiO2 nanoporous film consisting of SiO2 nanoparticles by pulsed laser deposition. However, to optimize the growth conditions of nanoporous films, it is important to understand the spatial and size distribution of nanoparticles produced by laser ablation. Here, we visualized laser-ablated SiO2 nanoparticles using a two-dimensional laser scattering imaging technique and investigated the influence of gas species and pressure on the spatial distribution of the nanoparticles in the gas phase. After the decay of the plasma emission within several microseconds, a spherical-shaped scattering image depicting the spatial distribution of SiO2 nanoparticles was obtained from a delay time of approximately 10 ms. In Ar gas, the sphericalshaped distribution of SiO2 nanoparticles changed to an ellipsoidal shape with increasing pressure, whereas in O2 gas, it changed a mushroom-like shape. These results show that the gas species and pressure are dominant parameters affecting the spatial distribution of nanoparticle formation

本文言語英語
ページ(範囲)185-188
ページ数4
ジャーナルJournal of Laser Micro Nanoengineering
16
3
DOI
出版ステータス出版済み - 2021

!!!All Science Journal Classification (ASJC) codes

  • 器械工学
  • 産業および生産工学
  • 電子工学および電気工学

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