Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching

Shinya Kato, Yasuyoshi Kurokawa, Yuya Watanabe, Yasuharu Yamada, Akira Yamada, Yoshimi Ohta, Yusuke Niwa, masaki Hirota

研究成果: ジャーナルへの寄稿レター査読

30 被引用数 (Scopus)

抄録

Silicon nanowire (SiNW) arrays were prepared on silicon substrates by metal-assisted chemical etching and peeled from the substrates, and their optical properties were measured. The absorption coefficient of the SiNW arrays was higher than that for the bulk silicon over the entire region. The absorption coefficient of a SiNW array composed of 10-μm-long nanowires was much higher than the theoretical absorptance of a 10-μm-thick flat Si wafer, suggesting that SiNW arrays exhibit strong optical confinement. To reveal the reason for this strong optical confinement demonstrated by SiNW arrays, angular distribution functions of their transmittance were experimentally determined. The results suggest that Mie-related scattering plays a significant role in the strong optical confinement of SiNW arrays.

本文言語英語
論文番号216
ページ(範囲)1-6
ページ数6
ジャーナルNanoscale Research Letters
8
1
DOI
出版ステータス出版済み - 6月 13 2013
外部発表はい

!!!All Science Journal Classification (ASJC) codes

  • 材料科学(全般)
  • 凝縮系物理学

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