Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching

Shinya Kato, Yasuyoshi Kurokawa, Yuya Watanabe, Yasuharu Yamada, Akira Yamada, Yoshimi Ohta, Yusuke Niwa, masaki Hirota

研究成果: ジャーナルへの寄稿レター

20 引用 (Scopus)

抄録

Silicon nanowire (SiNW) arrays were prepared on silicon substrates by metal-assisted chemical etching and peeled from the substrates, and their optical properties were measured. The absorption coefficient of the SiNW arrays was higher than that for the bulk silicon over the entire region. The absorption coefficient of a SiNW array composed of 10-μm-long nanowires was much higher than the theoretical absorptance of a 10-μm-thick flat Si wafer, suggesting that SiNW arrays exhibit strong optical confinement. To reveal the reason for this strong optical confinement demonstrated by SiNW arrays, angular distribution functions of their transmittance were experimentally determined. The results suggest that Mie-related scattering plays a significant role in the strong optical confinement of SiNW arrays.

元の言語英語
ページ(範囲)1-6
ページ数6
ジャーナルNanoscale Research Letters
8
発行部数1
DOI
出版物ステータス出版済み - 6 13 2013
外部発表Yes

Fingerprint

Silicon
Nanowires
Etching
nanowires
Metals
etching
silicon
metals
absorptivity
absorptance
Angular distribution
Mie scattering
Substrates
Distribution functions
transmittance
angular distribution
Optical properties
distribution functions
wafers
Scattering

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

これを引用

Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching. / Kato, Shinya; Kurokawa, Yasuyoshi; Watanabe, Yuya; Yamada, Yasuharu; Yamada, Akira; Ohta, Yoshimi; Niwa, Yusuke; Hirota, masaki.

:: Nanoscale Research Letters, 巻 8, 番号 1, 13.06.2013, p. 1-6.

研究成果: ジャーナルへの寄稿レター

Kato, S, Kurokawa, Y, Watanabe, Y, Yamada, Y, Yamada, A, Ohta, Y, Niwa, Y & Hirota, M 2013, 'Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching', Nanoscale Research Letters, 巻. 8, 番号 1, pp. 1-6. https://doi.org/10.1186/1556-276X-8-216
Kato, Shinya ; Kurokawa, Yasuyoshi ; Watanabe, Yuya ; Yamada, Yasuharu ; Yamada, Akira ; Ohta, Yoshimi ; Niwa, Yusuke ; Hirota, masaki. / Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching. :: Nanoscale Research Letters. 2013 ; 巻 8, 番号 1. pp. 1-6.
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abstract = "Silicon nanowire (SiNW) arrays were prepared on silicon substrates by metal-assisted chemical etching and peeled from the substrates, and their optical properties were measured. The absorption coefficient of the SiNW arrays was higher than that for the bulk silicon over the entire region. The absorption coefficient of a SiNW array composed of 10-μm-long nanowires was much higher than the theoretical absorptance of a 10-μm-thick flat Si wafer, suggesting that SiNW arrays exhibit strong optical confinement. To reveal the reason for this strong optical confinement demonstrated by SiNW arrays, angular distribution functions of their transmittance were experimentally determined. The results suggest that Mie-related scattering plays a significant role in the strong optical confinement of SiNW arrays.",
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AU - Kato, Shinya

AU - Kurokawa, Yasuyoshi

AU - Watanabe, Yuya

AU - Yamada, Yasuharu

AU - Yamada, Akira

AU - Ohta, Yoshimi

AU - Niwa, Yusuke

AU - Hirota, masaki

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