Optical properties of polycrystalline and epitaxial anatase and rutile TiO 2 thin films by rf magnetron sputtering

S. Tanemura, L. Miao, P. Jin, K. Kaneko, A. Terai, N. Nabatova-Gabain

    研究成果: ジャーナルへの寄稿学術誌査読

    175 被引用数 (Scopus)

    抄録

    We analyzed successfully the refractive index n, extinction coefficient k, and optical band gap E g of the fabricated polycrystalline and epitaxial TiO 2 films of rutile and anatase films by spectroscopic ellipsometry (SE). The provided samples were prepared by rf magnetron sputtering of TiO 2 target with Ar gas plasma under a variety of sputtering parameters such as total pressure, Ar gas flow rate, O 2 gas flow rate, applied sputtering power, substrate temperature and substrate materials. The covered wavelength for SE was from 0.75 to 5eV (1653-248nm in wavelength). As the conclusion, the films show higher values of refractive indices than the previously reported ones by other authors. Optical band gaps extrapolated by Tauc plot using the obtained extinction coefficient again show higher values than the known bulk data.

    本文言語英語
    ページ(範囲)654-660
    ページ数7
    ジャーナルApplied Surface Science
    212-213
    SPEC.
    DOI
    出版ステータス出版済み - 5月 15 2003

    !!!All Science Journal Classification (ASJC) codes

    • 化学 (全般)
    • 凝縮系物理学
    • 物理学および天文学(全般)
    • 表面および界面
    • 表面、皮膜および薄膜

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