Optical thin films grown by surface chemical reaction for high-power lasers

Zaitsu Shin-Ichi, S. Motokoshi, T. Jitsuno, M. Nakatsuka, T. Yamanaka

研究成果: Contribution to journalConference article査読

1 被引用数 (Scopus)

抄録

We developed a novel coating method using chemical reactions of gaseous reactants on a surface. A self-limiting nature of surface chemical reactions allows precisely controlled growth of films with high uniformity and controllability of thickness over large area. The nonuniformity of thickness distribution was under 1% over 240 mm in diameter. The film thickness had proportional relationship with a number of chemical reactions. TiO2 films at growth temperature of 25°C had a laser-induced damage threshold of 5 J/cm2 for 1-ns, 1.06-μm laser pulses. The laser damage resistance of TiO2 films decreased at higher growth temperature. TiO2 films grown at the high temperature had higher crystallinity. We clarified that the laser damages resulted from the local sites that absorbed the laser energy.

本文言語英語
ページ(範囲)140-145
ページ数6
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
4347
DOI
出版ステータス出版済み - 1 1 2001
外部発表はい
イベント32nd Annual Boulder Damage Symposium - Laser-Induced Damaged in Optical Materials: 2000 - Boulder, CO, 米国
継続期間: 10 16 200010 18 2000

All Science Journal Classification (ASJC) codes

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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