Optimal character-size exploration for increasing throughput of MCC lithographic systems

Makoto Sugihara

研究成果: Chapter in Book/Report/Conference proceedingConference contribution

3 引用 (Scopus)

抜粋

We propose a character size optimization technique to enhance throughput of multi-column-cell (MCC) lithographic systems in which transistor patterns are projected with multiple column cells in parallel. Each and every column cell is capable of projecting patterns with character projection (CP) and variable shaped beam (VSB) methods. Seeking the optimal character size of characters contributes to minimizing the number of EB shots and reducing the fabrication cost for ICs. Experimental results show that the character size optimization technique reduced 70.6% of EB shots in the best case with an available electron beam size.

元の言語英語
ホスト出版物のタイトルAlternative Lithographic Technologies
DOI
出版物ステータス出版済み - 6 19 2009
イベントAlternative Lithographic Technologies - San Jose, CA, 米国
継続期間: 2 24 20092 26 2009

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
7271
ISSN(印刷物)0277-786X

その他

その他Alternative Lithographic Technologies
米国
San Jose, CA
期間2/24/092/26/09

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • これを引用

    Sugihara, M. (2009). Optimal character-size exploration for increasing throughput of MCC lithographic systems. : Alternative Lithographic Technologies [72710L] (Proceedings of SPIE - The International Society for Optical Engineering; 巻数 7271). https://doi.org/10.1117/12.813884